
X-ray Bragg diffraction imaging (historically called “X-ray topography”) is a unique characterisation tool for assessing and visualising crystal quality and defects across a wide range of technologically important crystalline materials. Crystal defects can be very detrimental for the performance of the devices produced from the crystals. Application areas therefore include semiconductor materials (e.g. Si, Ge, SiC, GaN) and crystals for optical applications (e.g. quartz, sapphire, KTP, KTA and LBO).
The ESRF operates a world-unique synchrotron X-ray topography instrument which is used by clients from the semiconductor, power electronics, opto-electronics and MEMs industries.
From this webinar you will learn the physical basis of the imaging technique, the advantages of synchrotron-based topography and the information it provides on crystalline materials illustrated with different types of results from real materials.
Read more and register here